Previous Article Next Article Table of Contents Journal of Crystal Growth, Vol.240, No.3-4, 611-611, 2002 DOI10.1016/S0022-0248(02)00939-9 Export Citation The reactive ion etching of Bi2Ti2O7 thin films on silicon substrates and its image in atomic force microscopy (vol 235, pg 411, 2001) Wang Z, Sun DL, Hu JF, Cui DL, Xu XH, Wang D, Zhang Y, Wang M, Wang H, Chen HC Please enable JavaScript to view the comments powered by Disqus.