Journal of Crystal Growth, Vol.251, No.1-4, 388-391, 2003
InAs/InGaAsN quantum dots emitting at 1.55 mu m grown by molecular beam epitaxy
InAs/InGaAsN quantum dots have been grown by molecular beam epitaxy on GaAs substrates. Transmission electron microscopy shows the increase in the island size as compared to the InAs/InGaAs quantum dots. Room temperature photoluminescence at 1.55 mum has been demonstrated whose intensity was comparable to that of the InGaAsN/GaAs quantum wells emitting at 1.3 mum. The effect of nitrogen concentration on the PL peak position and intensity has been studied. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords:low dimensional structures;molecular beam epitaxy;arsenides-nitrides;semiconducting III-V materials