Journal of Crystal Growth, Vol.251, No.1-4, 777-781, 2003
Experimental extract and empirical formulas of refractive indices of GaAs and AlAs at high temperature by HRXRD and optical reflectivity measurement
Refractive indices of GaAs and AlAs at high temperature have been extracted by combining the high resolution X-ray diffraction and optical reflectivity measurement techniques. The comparison between the empirical formulas and experimental data on the indices of GaAs and AlAs has been made. A good agreement between them allows us to use empirical formulas to calculate the indices of GaAs and AlAs at high temperature over a wide wavelength range. The extracted data have been successfully employed in GaAs/AlAs DBR NIBE growth. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords:high resolution X-ray diffraction;refractive indices;molecular beam epitaxy;semiconductor III-V materials