화학공학소재연구정보센터
Journal of Crystal Growth, Vol.257, No.1-2, 7-18, 2003
Physical modelling of the melt flow during large-diameter silicon single crystal growth
The reported investigations concern physical modelling of Czochralski growth of silicon large-diameter single crystals. InGaSn eutectic was used as a modelling liquid, employing actual criteria of the real process (Prandtl, Revnolds, Grashof numbers, etc.) and geometric similarity. A multi-channel measuring system was used to collect and process the temperature and flow velocity data. The investigations were focused on the study of heat transfer, in particular, the instability of the "cold zone" of the melt at the crystallization front. (C) 2003 Elsevier B.V. All rights reserved.