Journal of Crystal Growth, Vol.267, No.3-4, 412-416, 2004
Influence of annealing and surfactant on InGaAsN/GaAs multiple quantum well
Influence of antimony (Sb) as a surfactant and annealing on the structural and optical properties of InGaAsN/GaAs multiple quantum-well (MQW) grown by metalorganic chemical vapor deposition (MOCVD) is studied. It was found that an increase in compressive strain from an analysis of the satellite peaks in high-resolution X-ray diffraction was observed with increasing interruption time and annealing temperature. The photocurrent (PC) peak of as-grown MQW is blue-shifted with introduction time of excess Sb flux during growth interruption process. It seems to be due to the improvement of structure properties at interface by a surfactant suppressing surface diffusion phenomenon. After annealing process, the PC peak is blue-shifted with increasing annealing temperature for all samples. It seems to be related with the compressive strain and QW intermixing. (C) 2004 Elsevier B.V. All rights reserved.
Keywords:high resolution X-ray diffraction;intermixing;photocurrent;surfactant;metalorganic chemical vapor deposition;InGaAsN