Using plasma-assisted molecular beam epitaxy (MBE), GaNxSb1-x films have been grown onto GaSb and GaAs substrates over a range of growth temperatures (310-460° C). The films showed excellent crystalline quality and a nitrogen incorporation of 0-1.75% measured by X-ray diffraction. These materials should enable access to wavelengths in the 2-4 μ m range. © 2005 Elsevier B.V. All rights reserved.