Journal of Crystal Growth, Vol.278, No.1-4, 198-202, 2005
InAs/GaSb type-II superlattices for high performance mid-infrared detectors
The superlattice (SL) design parameters of a 50 period InAs/GaSb SL structure with InSb-like interfaces (IFs) were systematically varied around the 26 &ANGS; InAs/27 &ANGS; GaSb design in order to explore the parameter space for maximum photoresponse in the 3-5 μ m mid-infrared atmospheric window. Using previously optimized growth conditions, the SL structures were grown on p-type GaSb substrates by molecular beam epitaxy with precisely calibrated growth rates. The electrical properties of the SLs were characterized by magnetic field-dependent Hall effect measurements below the carrier freeze-out temperature of the p-type substrate. Multi-carrier analysis at 4.2K determined an electron sheet carrier concentration of 8.5 x 10(10) cm(-2) with a mobility of 8200 cm(2)/Vs. Two sets of SLs were used in the optimization process: the first set with a fixed InAs width of 26,, and the second with a fixed GaSb width of 27 &ANGS; As the GaSb layer width varied from 15 to 27 the photoresponse cut-off wavelength shifted from 6.47 to 5.24 μ m. Similarly, as the InAs width varied from 26 to 13 the cut-off wavelength shifted from 5.08 to 3.05 μ m. The strongest photoresponse in the 3-5 μ m mid-IR window was achieved with the InAs (20 &ANGS;)/GaSb (27 &ANGS;) SL design. © 2005 Elsevier B.V. All rights reserved.
Keywords:superlattices;molecular beam epitaxy;antimonides;InAs/GaSb;infrared detector;semiconductor devices