Journal of Crystal Growth, Vol.301, 225-229, 2007
Characterization of heavily Sn-doped GaAs grown by migration-enhanced epitaxy
The saturation of electron concentration and mobility at high doping concentration observed in the samples grown by low-temperature migration-enhanced epitaxy (MEE) is found to be strongly related to the morphology change in the film. The structural characteristics of the heavily Sn-doped GaAs have been further investigated by means of X-ray diffraction (XRD) measurement and transmission electron microscopy (TEM). The results indicate that the (GaAs)(1-x)(Sn-2)(x) alloy is formed in the Sn-doped GaAs with the doping concentration higher than 1 x 10(19) cm(-3). However, when the Sn concentration exceeds 1 x 10(21) cm(-3), the formation of Sn-rich clusters becomes dominant. This formation of (GaAs)(1-x)(Sn-2)(x) alloy and Sn clusters is found to be responsible for the saturation of the electron concentration and mobility in the heavily doped samples. (c) 2006 Elsevier B.V. All rights reserved.
Keywords:doping;impurities;segregation;migration enhanced epitaxy;molecular-beam epitaxy;semiconducting gallium arsenide