Carbon films with variable sp(3)/sp(2) bonding ratio can be deposited on a variety of substrates at room temperature, using the cathodic vacuum are deposition process. The variation in their surface morphology as a function of He and N-2 partial pressure during growth have been investigated and it has been shown that the morphology of the films can be varied from the mirror-like smooth tetrahedrally bonded amorphous carbon (ta-C) films through nanocluster to fibrous-type carbon. This paper reviews the work carried out on Field Emission from these various carbon films. Threshold fields as low as 1 V/mu m for emission current densities of 1 mu A/cm(2) and emission site densities of up to 10(4)-10(5)/cm(2) have been obtained.