Lead titanate (PbTiO3) thin films were prepared by rf magnetron sputtering using ceramic target. Perovskite phase PbTiO3 was obtained on platinum-coated glass substrate at substrate temperature of 580 degreesC. On the contrary, crystal structure of the films on glass substrate was amorphous. After this film was annealed at 500 degreesC in air, crystal structure was converted to perovskite one. In proportion to the rf power, deposition rate increased. When rf power and substrate temperature were 300 W and 580 degreesC, deposition rates of the films deposited on glass substrate and platinum-coated glass were 50 and 20 nm/min, respectively.