This study conducted a simulation work on the layer uniformity of sputter coatings in a vacuum chamber based on deconvolution of measuring plasma emission spectra, and compared to the corresponding measurements of film thickness distribution. The simulative method started from an Ar-normalized Sr intensity distribution derived from deconvoluting the plasma spectra by using Abel inversion method, which was considered as the spatial distribution of the sputtering rate of the source target. The thickness profile on the substrate was then calculated based on the source with nth power of cosine law assumption. It was observed that the exponent of cosine law approached zero due to collisions of species. Good agreement between simulation and experimental observation revealed that the simulation method based on spectroscopic measurement could be used as an in situ estimation of the deposition uniformity of similar systems.