LaNiO3 thin films were deposited on Si substrates by a modified metalorganic decomposition technique using lanthanum nitrate and nickel acetate as the start sources. The structures of the films were characterized by X-ray diffraction and scanning electron microscope. Highly (1 0 0)-oriented LaNiO3 films with smooth and crack-free surfaces were obtained using rapid thermal annealing method. The resistivity versus temperature curves of the textured LaNiO3 films showed that the films possessed good metallic character.