Applied Surface Science, Vol.182, No.3-4, 361-365, 2001
Characteristics of UHVCVD grown Si/Si1-x-yGexCy/Si quantum well heterostructure
Single well strained-layer Si1-x-yGexCy heterostructures have been grown by ultra-high vacuum chemical vapor deposition. The effect of addition of C on strain and vibrational characteristics of Si1-xGex (y = 0) layer has been studied. The results of the carrier confinement characteristics, device transconductance and optical transitions in a Si/SiGeC/Si quantum well are presented.