Applied Surface Science, Vol.211, No.1-4, 2-5, 2003
Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine
Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented. (C) 2003 Elsevier Science B.V. All rights reserved.