The growth of ternary silicides and beta-FeSi2 on ternary silicides for pseudobinary system MnSi1.7-beta-FeSi2 was investigated by reactive deposition epitaxy (RDE). The structural properties of resultant silicide layers were examined by X-ray diffraction (XRD) and transmission electron microscopy (TEM). It was found that a FexMn1-xSi1.7 layer having a Mn11Si19 crystalline structure was formed when Fe was deposited within limited solubility range in MnSi1.7. On the other hand, beta-FeSi2 islands were grown on FexMn1-xSi1.7 layers when excess Fe atoms were deposited. The growth evolution and phase transitions of the silicide layers are discussed. (C) 2003 Elsevier Science B.V. All rights reserved.