Amorphous silicon based solar cells were deposited by dc plasma decomposition of silane and hydrogen. As the deposition rate increases, the processing time decreases and becomes comparable to the time required to heat the glass superstrate to the deposition temperature. This allows de-coupling of the temperature of the growing film that determines the hydrogen out-diffusion processes from that of the gas, which influences the formation of multiple silicon containing molecules that increase the light induced degradation of the material. Consequently, reducing the initial temperature of the superstrate is shown to maximize the initial performance while maintaining the stability obtained at higher deposition chamber temperatures. (C) 2003 Published by Elsevier B.V.