Applied Surface Science, Vol.238, No.1-4, 238-241, 2004
Deposition of 10-undecenoic acid self-assembled layers on H-Si(111) surfaces studied with AFM and FT-IR
Self-assembling layers of 10-undecenoic acid (UA) were deposited on H-terminated Si(111) surfaces and characterized with atomic force microscopy (AFM) and Fourier-transform infrared (FT-IR) spectroscopy measurements for the first time. The unique island structures are deposited by layer-by-layer growth mechanism. The IR spectra suggest that the multilayers grown over the first monolayer are deposited by weak intermolecular interactions such as Van der Waals force and hydrogen bonding. (C) 2004 Elsevier B.V. All rights reserved.