Imprint technique was successfully applied for the creation of optically variable diffractive images by combining direct imprint of single oriented grating, forming of desired graphic art with a set of polished stamps and reactive ion etching. Fidelity of the etching mask as well as shape of the grating transferred into the silicon substrate was analyzed by atomic force microscope. Problems, which occur during the fabrication process, are discussed. As a result, optically variable image composed of three orientations of gratings is presented. Proposed technique could find further application in the origination of not too complicated diffraction graphic arts suitable for document security applications. © 2004 Elsevier B.V. All rights reserved.