Tin oxide (SnO2) thin films were prepared on various substrates by the excimer laser metal organic deposition (ELMOD) and the thermal metal organic deposition (MOD) processes. When the amorphous SnO2 film prepared at 300 degrees C on (1 0 0) Si, and (1 0 10) sapphire substrates was irradiated by the KrF excimer laser at a fluence of 200 mJ/cm(2) and 25 degrees C, polycrystalline SnO2 films were obtained. When the amorphous SnO2 film prepared at 300 degrees C on the (1 0 0) SrTiO3 and (1 0 0) TiO2 substrates was irradiated by the KrF excimer laser at the same conditions, a (1 1 0) oriented SnO2 film on the SrTiO3 substrate and a (1 0 0) oriented SnO2 film on the TiO2 substrate were obtained. Using the pole-figure measurements, a SnO2 film on TiO2 substrate was found to be epitaxially grown. On the other hand, when a thermal MOD process was used, all the product films on their substrates were of the polycrystalline phase whereas the orientation of the films depended on the substrate. Polycrystalline and epitaxial growth of the SnO2 films by the ELMOD process are also discussed. (c) 2005 Elsevier B.V. All rights reserved.