A new tip insulating process for active metal tips allowing atomic resolution ECSTM imaging has been developed. This new method using cathodic cataphoretic paint deposition has been tested successfully. The insulating deposited film appears homogeneous under optical microscopy and it has been characterised by infra red and SEM analysis. The depositing layer of the paint is sufficiently dense to effectively resist electrolyte ion penetration and resists corrosion in various acidic, basic aqueous or non-aqueous media. The coating film does not reduce the imaging capability of the ECSTM even to atomic resolution. This new insulating method adds to the approaches available to those preparing tips for ECSTM. This approach would also be of Great utility for the preparation of microelectrodes using active metals. (c) 2005 Elsevier B.V. All rights reserved.