Surface modifications through line etching of SrRuO3 thin films have been carried out using a scanning tunneling microscope under ambient conditions. The line etching is found to be dependent on both bias voltage and scan speed for a given number of scan repetitions. We observe that an applied voltage above a threshold value is required for successful line etching. The depth of the etched lines is increasing with increasing bias voltage and scan repetitions as well as with decreasing scan speed. Moreover, sub-50 nm laterally confined mesa structures could be reproducibly etched on the SrRuO3 thin film surfaces. (c) 2006 Elsevier B.V. All rights reserved.