화학공학소재연구정보센터
Applied Surface Science, Vol.253, No.11, 5179-5183, 2007
Structural, electrical and optical properties of Gd doped and undoped ZnO : Al (ZAO) thin films prepared by RF magnetron sputtering
The influence of the gadolinium doping on the structural features and opto-electrical properties of ZnO:Al (ZAO) films deposited by radio frequency (RF) magnetron sputtering method onto glass substrates was investigated. X-ray analysis showed that the films were polycrystalline fitting well with a hexagonal wurtzite structure and have preferred orientation in [002] direction. The Gd doped ZAO film with a thickness of 140 nm showed a high visible region transmittance of 90%. The optical band gap was found to be 3.38 eV for pure ZnO film and 3.58 eV for ZAO films while a drop in optical band gap of ZAO film was observed by Gd doping. The lowest resistivities of 8.4 x 10(-3) and 10.6 x 10(-3) Omega cm were observed for Gd doped and undoped ZAO films, respectively, which were deposited at room temperature and annealed at 150 degrees C. (c) 2006 Elsevier B.V. All rights reserved.