X-ray reflectivity and atomic force microscopy analyses were performed in the Si/WTi (7 nm)/NiFe (5 nm)/FeMn (13 nm)/WTi (7 nm) exchange-biased system prepared by magnetron sputtering. Layer-by-layer analyses were done in order to have interfacial roughness parameters quantitatively. X-ray reflectivity results indicate that the successive layer deposition gives rise to a cumulative roughness. In addition, the atomic force microscopic images analyses have revealed that the roughness enhancement caused by the successive layer deposition can be associated with an appearance of a longer wavelength roughness induced by the NiFe layer deposition. (C) 2007 Elsevier B.V. All rights reserved.