Previous Article Next Article Table of Contents Advanced Materials, Vol.11, No.4, 314-318, 1999 DOI10.1002/(SICI)1521-4095(199903)11:4<314::AID-ADMA314>3.0.CO;2-E Export Citation Dendrimer-based self-assembled monolayers as resists for scanning probe lithography Tully DC, Wilder K, Frechet JMJ, Trimble AR, Quate CF Please enable JavaScript to view the comments powered by Disqus.
