Chemical fluid deposition (CFD) is a novel approach to metal deposition that involves the chemical reduction of organome- tallic compounds in supercritical carbon dioxide to yield high purity films at low temperature. Since supercritical CO2 can exhibit densities that approach those of a liquid solvent while retaining the transport properties of a gas, CFD is essentially a hybrid technique that uniquely blends the advantages of chemical vapor deposition (CVD) and electroless plating. Here, we describe the deposition of high-purity films of Pt, Pd, Au, and Rh onto inorganic and polymer substrates by the reduction of appropriate precursors in CO2 at 60 degrees C.