Previous Article Next Article Table of Contents Advanced Materials, Vol.13, No.9, 670-672, 2001 DOI10.1002/1521-4095(200105)13:9<670::AID-ADMA670>3.0.CO;2-3 Export Citation Novel positive-tone chemically amplified resists with photoacid generator in the polymer chains Wu HP, Gonsalves KE Please enable JavaScript to view the comments powered by Disqus.
