Nanoporous ultra-low-kappa fluoropolymer composite films via plasma polymerization of allylpentafluorobenzene and magnetron sputtering of poly(tetrafluoroethylene)

Fu GD; Zhang Y; Kang ET; Neoh KG

Advanced Materials, Vol.16, No.9-10, 839-839, 2004

Fu GD, Zhang Y, Kang ET, Neoh KG

Fluoropolymer composite films with nanoporous morphology and dielectric constants less than 2.0, consisting of plasma-polymerized allylpentafluorobenzene (pp-APFB) nanospheres and magnetron sputter-deposited poly (tetrafluoroethylene) (s-PTFE) dense layers, have been prepared on hydrogen-terminated Si(100) (H-Si) substrates (see Figure).