A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography (Uniform films with thicknesses ranging from below 50 nm to over 1 mu m can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm (see Figure) are imprinted at room temperature with a pressure of less than 0.1 Wa.