Advanced Materials, Vol.18, No.8, 1020-1020, 2006
Hybrid approaches to nanolithography: Photolithographic structures with precise, controllable nanometer-scale spacings created by molecular rulers
A hybrid approach to nanolithography combines conventional lithography with chemical self-assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self-assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.