We report an artful method to form a stable pattern of chiral polyaniline nanocomposities (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self-assembly, leading to the formation of a (DR/PAA)(2)DR/(CPAN/DR)(n) film on the substrate. After selective exposure to UV light through a photomask and the development process, a defined pattern is formed.