In the present communication we describe a photolithographic method to produce polyaniline (PANI) patterns using PANI modified with a traceless removable functional group (nitrosated polyaniline, PANI-NO) and external inexpensive polymeric photoacid generators (poly (vinyl chloride), PVC). Therefore, residual sub-products created by irradiation of the plate do not remain occluded in the polymeric films. The borders of the patterns are better defined than in the case of chemical lithography using inorganic acids as the hydrolyzing agent.