처리조건이 비닐리덴플루오라이드-트리플루오로에틸렌(60/40몰%) 공중합체 필름의 Curie 전이와 압전성에 미치는 영향

김상용; 손병혁; 김진사

Polymer(Korea), Vol.14, No.1, 41-49, February, 1990

Effects of Treatment Conditions on the Curie Transition and Piezoelectricity of Vinylidene Fluoride-Trifluoroethylene(60/40 mol%) Copolymer Films

김상용, 손병혁, 김진사

초록

강유전성 고분자인 비닐리덴플푸오라이드와 트리플루오로에틸렌(60/ 40몰%)의 공중합체 필름의 Curie전이를 시차열분석, X-선회절실험, 점탄성적 거동및 압전거동으로부터 확인하였다. 분극, 연신 및 열처리가 이 공중합체 필름의 Curie 전이온도와 압전 응력 상수에 미치는 영향을 고찰하였다. 분극 전장이 증가할수록Curie 온도와 압전 응력 상수는 증가하였다. Curie 전이 거동은 분극 전장보다는 분극 온도에의하여 더 많은 영향을 받는다. 연신비를 증가시킴에 따라 또는 열처리에의해서 Curie온도는 낮아지나 압전 응력 상수는 증가한다.

The Curie transition of the ferroelectric vinylidene fluoride-trifluoroethylene (60/ 40mo1%) copolymer film was investigated by differential scanning calorimetry, X-ray diffractometry and viscoelastic and piezoelectrical measurements. Effects of poling, drawing and annealing on the Curie temperature and the piezolelectric stress constant of this copolymer film were studied. The Curie temperature and the piezoelectric stress constant increased with the increase in the poling field. Effect of the poling temperature on the Curie transition behavior was greater than that of the poling field. The Curie temperature decreased and the piezoelectric stress constant increased by annealing and drawing.

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[4] Higoshihata Y, Sako J, Yagi T, Ferroelectrics, 32, 85 (1981)

[5] Yamada T, J. Appl. Phys., 53, 6335 (1982)

[6] Koga K, Ohigashi H, J. Appl. Phys., 59, 2142 (1986)

[7] Lovinger AJ, Furukawa T, Davis GT, Broadhurst MG, Ferroelectrics, 50, 227 (1983)

[8] Lovinger AJ, Furukawa T, Davis GT, Broadhurst MG, Polymer, 24, 1225 (1983)

[9] Tashiro K, Takano K, Kobayashi M, Chatani Y, Tadokoro H, Ferroelectrics, 57, 297 (1984)

[10] Lovinger AJ, "Developments in Crystalline Polymers," D.C. Bassett, Ed., Vol. 1, Chap. 5, Applied Science (1982)

[11] Yagi T, Tatemoto M, Sako J, Polym. J., 12, 209 (1980)

[12] Wang TT, Herbert JM, Glass AM, "The Applications of Ferroelectric Polymers," Chap. 5, Blackie (1988)

[13] Koizumi N, Murata Y, Oka Y, Jpn. J. Appl. Phys., 23, 1324 (1984)

[14] Scheinbeim JI, Chung KT, Pae KD, Newman BA, J. Appl. Phys., 50, 6101 (1979)