Experimental results are reported indicating that a constant homogeneous magnetic field of 12 kGs causes a decrease of the copper deposition overpotential (increase of copper deposition rate) in the Tafel potential region. The experimental results presented in this paper were initially submitted to this journal on 13 December, 1988 as a continuation of the studies in C. Noninski et al., 33rd ISE meeting, 1, 939 (1982) [1], V. Noninski et al., Elektronnaya obrabotka materialov, 1, 50 (1986) [2]. Thus, the effect of magnetic field on copper electrodeposition in the Tafel potential region has been established prior to the paper J. P. Chopart et al., electrochim. Acta 36, 459 (1991) [3], which does not appear to have been recognized in the latter.