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Electrochemical and Solid State Letters, Vol.7, No.3, F15-F17, 2004
Effect of Bi2O3 buffer layers on retention properties of SrBi2Ta2O9 thin films by MOCVD
Polarization retention characteristics of ferroelectric SrBi2Ta2O9 (SBT) thin films prepared by metallorganic chemical vapor deposition (MOCVD) with and without Bi2O3 buffer layers on Pt/Ti/SiO2/Si substrates have been investigated. The retention loss of Pt/SBT/Pt capacitor is larger than that of Pt/SBT/Bi2O3/Pt capacitor. The polarization of Pt/SBT/Pt and Pt/SBT/Bi2O3/Pt capacitors at 3 x 10(4) s showed a loss of approximately 9 and 6%, respectively. In SBT films with a Bi2O3 buffer layer, both the second phase and the bismuth deficient layer were not formed at the interface between the SBT films and Pt bottom electrode. SBT films with a Bi2O3 buffer layer have an excellent interface property, resulting in an improvement of retention properties of SBT thin films. (C) 2004 The Electrochemical Society.