A fabrication method is described to form high aspect ratio, complex structures. This fabrication method combines nanoimprint lithography and photolithography together, to produce macroscale features with microscale structures on them in a sequential process, with one ultraviolet exposure step and no transfer layers. The imprint step used a prefabricated stamp to directly emboss the photosensitive polymer prior to ultraviolet exposure without affecting the photosensitivity of the polymer. A temporary glass layer was deposited over the imprinted structure to preserve the fine features so that the large-scale photodefinition process could be completed. Avatrel 2090P was photodefined with diffractive grating features on top of polymer pillars. (C) 2004 The Electrochemical Society.