A novel metal patterning process was developed to reduce the number of chemical processing steps and to obtain 10 mm line width fine patterns. Films of amorphous TiO2 and water-soluble polyvinyl alcohol were used as photocatalytic layers. UV light was directed through a photomask onto the photocatalytic layers. Pd(II) in an aqueous solution was reduced to Pd(0) by the exposed TiO2 and deposited on the exposed regions. Selective electroless Ni plating on the Pd patterns provided Ni patterns on the TiO2 film. Selective growth of carbon nanotubes on the Ni patterns was carried out by plasma-enhanced chemical vapor deposition. (C) 2005 The Electrochemical Society.