We introduce a method for fabricating metal patterns based on a fully additive and nonvacuum process for large size displays. The bilayer thin-film structure of polyvinylalcohol and amorphous TiO2 provides enhanced life-time and uniformity of photochemical activity. This new method is particularly attractive for the large size copper mesh patterns for electromagnetic interference shielding applications in plasma display panel optical filters. Furthermore, the electromagnetic interference shielding efficiencies of the copper mesh with various characteristic dimensions of line width and thickness were investigated. (c) 2005 The Electrochemical Society.