This paper describes an electroless deposition method for fabricating microscale metal patterns on polyimide surfaces. This method uses the selective deposition of catalytic Pd seeds via the photoinduced oxidation of Sn(II) compounds. The preparation process requires three steps: a first step in which the adsorption of Sn(II) compounds occurs on the surface of the polyimide film through ion exchange reactions, a second step in which the photoinduced oxidation of the Sn(II) compounds with atmospheric oxygen occurs in ultraviolet light (UV) irradiated areas, and a third step comprising the deposition of Pd2+ ions in nonirradiated areas, which are simultaneously reduced. (c) 2006 The Electrochemical Society.