Solid-State Electronics, Vol.44, No.8, 1507-1509, 2000
Cryogenic temperature non-scaling of linear resistance in n-MOSFETs exhibiting reverse short-channel effect
An enhancement of the non-scaling of the linear resistance with channel length is observed at low temperatures, despite reduced reverse short channel effect. This imposes a significant limitation on the low temperature operation of deep submicron CMOS devices. An increased surface roughness scattering in shorter channel devices is suggested to explain the gate overdrive and temperature dependence.