Solid-State Electronics, Vol.44, No.11, 1989-1995, 2000
The influence of different isolation processes on the performance of AlGaAs/GaAs heterojunction bipolar transistors for power applications
AlGaAs/GaAs heterojunction bipolar transistors have been fabricated by two kinds of different isolation approaches, proton implantation isolation and micro-airbridge technique, respectively. A detail comparison of the device performances is presented in the maximum collector current, the knee voltage, the maximum output power and the power-added efficiency. The differences of their DC and power performances are discussed and analyzed.