화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Macromolecular Research, Vol.16, No.1, 31-35, January, 2008
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Thermally Stable Photoreactive Polymers as a Color Filter Resist Bearing Acrylate and Cinnamate Double Bonds
Seung Hyun Cho, Hyun Soon Lim1, Byung Kuk Jeon1, Jung Min Ko1, Jun Young Lee1, †, and Whan Gun Kim2
  • Polymer Technology Institute, Sungkyunkwan University, Suwon 440-746, Korea
  • 1Department of Chemical Engineering, Sungkyunkwan University, Suwon 440-746, Korea
  • 2Department of Applied Chemistry, Seokyeong University, Seoul 136-704, Korea
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Photoreactive polymers as a color filter resist containing both photoreactive acrylate and cinnamate double bonds were synthesized usin two step reactions. The chemical structures of the synthesized polymers were confirmed by 1H-NMR and FT-IR spectroscopy. The photoreactive polymers were quite soluble in most common organic solvents and produced excellent quality thin films by spin-coating. The photocuring kinetics of the acrylate and cinnamate double bonds were examined by FT-IR and UV-Vis spectroscopy, which confirmed the excellent photoreactivity of both the acrylate and cinnamate double bonds in the polymers. Upon UV irradiation, photocuring was almost completed within approximately 5 min, irrespective of the type of the prepolymers. The polymers also exhibited superior thermal stability, showing little change in transmittance in the visible region even after heating to 250 ℃ for one hour. Photolithographic micropatterns could be obtained with a resolution of a few microns.
Keywords:photoreactive polymer;photocure kinetics;photolithographic micropattern;thermal stability;optical transmittance
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