Electrophretic deposition (EPD) is a ceramic process. Although the kinetics for EPD have been established. However, there are still some ambiguities. In present study. a modified kinetic model was applied to describe the completely different behavior of EPD at - 10 and -40 V respectively. The variation of the concentration profile during electrophoretical deposition at -10 and -40V was simulated to explain what affected the EPD process. Based on the simulation, the depletion of colloidal particles near the electrode may be responsible for the EPD kinetic behaviors. (C) 2007 Elsevier B.V. All rights reserved.