화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제

양승관; 박찬언; 강종희; 안광덕

Polymer(Korea), Vol.18, No.4, 622-631, July, 1994

Export Citation

화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제

Inhibition of Surface Insolubilization in Chemically Amplified Positive Type Deep-UV Resists

양승관, 박찬언, 강종희, 안광덕

초록

수지를 matrix로 사용하고 tert-butoxycarbonyl(t-BOC)기로 보호된 phosphazene, TBP를 용해억제제로 사용하며 광산발생제로는 triphenylsulfonium hexafluoroantimonate,

Microlithographic evaluation was done on chemically amplified positive type deep-UV resist, which is composed of novolac resin as a matrix, tert-butoxycarbonyl(t-BOC) protected phosphazene, TBP as a dissolution inhibitor and triphenylsulfonium hexafluoroantimonate, TPSHFA or mixture of TPSHFA and pyrogallol tris(methane sulfonate), PTMS as photoacid generators. Severe surface insolubilization was shown with photoresist employing TPSHFA, an onium salt, as a photoacid generator, and such problem could be largely alleviated by employing mixture of photoacid generators composed of TPSHFA and PTMS, an organic photoacid generator. It is confirmed that the photoresists employing mixture of TPSHFA and PTMS as photoacid generators show better environmental suability than those

[References]

Powell MW, Solid State Technol., 32(3), 66 (1989)
Powell MW, Solid State Technol., 34(12), 54 (1991)
Reichmanis E, Houlihan FM, Nalamasu O, Neenan TX, Chem. Mater., 3(3), 394 (1991)
Lamola A, Szmanda C, Thackeray J, Solid State Technol., 34(8), 53 (1991)
Nalamasu O, Cheng M, Kometani JM, Vaidya S, Reichmanis E, Thompson LF, Proc. SPIE Int. Soc. Opt. Eng., 1262, 32 (1990)
Chatterjee S, Jain S, Lu PH, Khanna DN, Potvin RE, McCaulley JA, Rafalko J, Polym. Eng. Sci., 32(21), 1571 (1992)
MacDonald SA, Hinsberg WD, Wendt HR, Clecak NJ, Willson CG, Chem. Mater., 5(3), 348 (1993)
Nalamasu O, Reichmanis E, Hanson JE, Kanga RS, Heimbrook LA, Emerson AB, Baiocchi FA, Vaidya S, Polym. Eng. Sci., 32(21), 1565 (1992)
Funhoff DJH, Binder H, Schwalm R, Proc. SPIE Int. Soc. Opt. Eng., 1672, 46 (1992)
Schlegel L, Ueno T, Shiraishi H, Iwayanagi T, Chem. Mater., 2(3), 299 (1990)
Allcock HR, "Phosphorous-Nitrogen Compound," Academic Press, New York, U.S.A. (1972)
Yang SK, Park CE, Ahn KD, Polym.(Korea), 17(3), 335 (1993)
Briggs D, Riviere JC, "Practical Surface Analysis," 2nd ed., El. by D. Briggs and M.P. Seah, vol. I, p. 134 ~ 136, John Wiley & Sons, Ltd. (1990)

[1] Powell MW, Solid State Technol., 32(3), 66 (1989)

[2] Powell MW, Solid State Technol., 34(12), 54 (1991)

[3] Reichmanis E, Houlihan FM, Nalamasu O, Neenan TX, Chem. Mater., 3(3), 394 (1991)

[4] Lamola A, Szmanda C, Thackeray J, Solid State Technol., 34(8), 53 (1991)

[5] Nalamasu O, Cheng M, Kometani JM, Vaidya S, Reichmanis E, Thompson LF, Proc. SPIE Int. Soc. Opt. Eng., 1262, 32 (1990)

[6] Chatterjee S, Jain S, Lu PH, Khanna DN, Potvin RE, McCaulley JA, Rafalko J, Polym. Eng. Sci., 32(21), 1571 (1992)

[7] MacDonald SA, Hinsberg WD, Wendt HR, Clecak NJ, Willson CG, Chem. Mater., 5(3), 348 (1993)

[8] Nalamasu O, Reichmanis E, Hanson JE, Kanga RS, Heimbrook LA, Emerson AB, Baiocchi FA, Vaidya S, Polym. Eng. Sci., 32(21), 1565 (1992)

[9] Funhoff DJH, Binder H, Schwalm R, Proc. SPIE Int. Soc. Opt. Eng., 1672, 46 (1992)

[10] Schlegel L, Ueno T, Shiraishi H, Iwayanagi T, Chem. Mater., 2(3), 299 (1990)

[11] Allcock HR, "Phosphorous-Nitrogen Compound," Academic Press, New York, U.S.A. (1972)

[12] Yang SK, Park CE, Ahn KD, Polym.(Korea), 17(3), 335 (1993)

[13] Briggs D, Riviere JC, "Practical Surface Analysis," 2nd ed., El. by D. Briggs and M.P. Seah, vol. I, p. 134 ~ 136, John Wiley & Sons, Ltd. (1990)