In this paper, we report on a comparative study of active screen plasma nitriding (ASPN) and conventional dc plasma nitriding (CPN) behavior of 30CrNiMo8 low-alloy steel that has been examined under various process conditions. The process variables included active screen setup parameters (screen and iron plate top lids placed on the screen setup with 8 mm of hole size), treatment temperature (550 and 580 degrees C), gas mixture (75/25 and 25/75 of N-2/H-2) and treatment time (5 and 10 h) in 500 Pa pressure. The structure and phases composition of the diffusion zone and compound layer were studied by X-ray diffraction (XRD), microhardness tests, light optical microscopy and scanning electron microscopy (SEM). It was observed that treated sample surfaces in both CPN and ASPN methods consist of gamma' and epsilon phases, and while the nitriding time and/or temperature increases, the intensity of F phase in the compound layer will increase for ASPN and decrease for CPN method. Results show that the amount of nitrogen transferred from holes of screen toward the sample surface via sputtering and re-condensation mechanism can be affected due to the hardness and thickness of the layer. (c) 2007 Elsevier B.V. All rights reserved.