Advanced Materials, Vol.19, No.19, 2797-2797, 2007
Well-aligned nanocylinder formation in phase-separated metal-silicide-silicon and metal-germanide-germanium systems
Well-aligned nanocylinder formation (see figure) is carried out by using conventional sputtering deposition. Various metal-silicide-silicon and metal-germanide-germanium systems exhibit uniform phase separation with ordered cylinder arrays in a matrix with periodic spacing from 1.9 to 20.2 nm. There is a correlation between the periodic spacing of the cylinders and the eutectic temperatures in these systems.