In the present study, an artificial neural network (ANN) model and a theoretical model are established to predict the kinetic behavior of electrophoretic deposition (EPD). Both the theoretical model and the ANN model describe the kinetic behavior of EPD at a low-applied voltage (below 15 V) well. However, the theoretical model failed to predict the behavior at the higher applied voltages of 40 and 50 V. In contrast, the proposed ANN model not only showed enhanced numerical accuracy, but was also generic to other operational conditions as well. Compared to the theoretical model, the ANN model shows outstanding capability of predicting actual kinetic behavior. (C) 2007 Elsevier B.V. All rights reserved.