This paper describes TiO2 nanotube arrays prepared by anodic oxidation of Ti substrates using pulse voltage waveforms. Voltages were pulsed between 20 and -4 V or between 20 and 0 V with varying durations from 2 to 16 s at the lower limit of the pulse waveform. Ammonium fluoride or sodium fluoride (and mixtures of both) was used as the electrolyte with or without added medium modifier (glycerol, ethylene glycol, or poly (ethylene glycol) (PEG 400)) in these experiments. The pulse waveform was optimized to electrochemically grow TiO2 nanotubes and chemically etch their walls during its cathodic current flow regime. The resultant TiO2 nanotube arrays showed a higher quality of nanotube array morphology and photoresponse than samples grown via the conventional continuous anodization method. Films grown with a 20 V/-4 V pulse sequence and pulse duration of 2 s at its negative voltage limit afforded a superior photoresponse compared to other pulse durations. Specifically, the negative voltage limit of the pulse (-4 V) and its duration promote the adsorption of NH4+ species that in turn inhibits chemical attack of the growing oxide nanoarchitecture by the electrolyte F- species. The longer the period of the pulse at the negative voltage limit, the thicker the nanotube walls and the shorter the nanotube length. At variance, with 0 V as the low voltage limit, the longer the pulse duration, the thinner the oxide nanotube wall, suggesting that chemical attack by fluoride ions is not counterbalanced by NH3/NH4+ species adsorption, unlike the interfacial situation prevailing at -4 V. Finally, the results from this study provide useful evidence in support of existing mechanistic models for anodic growth and self-assembly of oxide nanotube arrays on the parent metal surface.