Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for lambda=46.9 nm radiation a penetration depth in excess of 150 nm. This laser-based extreme ultraviolet interferometric setup allows printing of 0.5x0.5 mm(2) areas with different nanoscale patterns using a compact tabletop system and exposure times of tens of seconds. (c) 2007 American Vacuum Society.