TiZrV films, grown at the deposition angles of 0 degrees and 70 degrees, were used for the study of the oxygen-adsorption process. When the deposition angle is 0 degrees, the appearance of the film is dense columnar structure. However, the film gown at the glancing angle of 70 degrees is composed of porous and isolated columns, which are made of fine clusters. The activated TiZrV films have the capability to absorb oxygen at room temperature. The component Zr is more easily oxidized than Ti and V components when the TiZrV film is exposed in oxygen. The content of oxidized Ti and oxidized V does not linearly increase with the increase of oxygen exposure when there is a metallic Zr component on the surface of the film. (C) 2007 Elsevier B.V. All rights reserved.