We report on the optical parameters of the semiconductor thin films determination. The method is based on the dynamical modeling of the spectral reflectance function combined with the genetic optimization of the initial model. The spectral dependency of the thin film optical parameters computation is based on the optical transitions modeling. The combination of the dynamical modeling and the genetic optimization enable comfortable analysis of the spectral dependences of the optical parameters and incorporation of the microstructure effects on the multilayer system optical properties. The results of the optical parameters of i-a-Si thin films determination are presented. (C) 2007 Published by Elsevier B.V.